high vacuum diffusion pump system for cvd

high vacuum diffusion pump system for cvd

The diffusion pump system consists of a diffusion pump, its related auxiliary equipment, and a backing pump. It is typically used to create and maintain high vacuum or ultra-high vacuum environments

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The diffusion pump system consists of a diffusion pump, its related auxiliary equipment, and a backing pump. It is typically used to create and maintain high vacuum or ultra-high vacuum environments. The design of the diffusion pump system is intended to meet specific vacuum requirements and ensure efficient and stable system operation.

Components:

Diffusion Pump: The core component used to generate ultra-high vacuum. The diffusion pump ejects vapor to drag gas molecules and remove them, thereby achieving vacuum.

Backing Pump: The backing pump (e.g., rotary vane pump, Roots pump) reduces the system pressure to the range where the diffusion pump can operate effectively, usually between 10⁻¹ and 10⁻³ Torr.

Condenser: The condenser cools the diffusion pump vapor, condensing it back into a liquid that returns to the diffusion pump, aiding in oil recovery and maintaining pump operation.

Pressure Sensors and Controllers: The system is usually equipped with multiple pressure sensors to monitor vacuum levels at different points. The controller adjusts system operation automatically based on sensor data.

Cooling System: As the diffusion pump and backing pump generate significant heat during operation, an effective cooling system (water or air cooling) is required to maintain the equipment within the proper temperature range.

Valves and Piping: The vacuum system's valves and piping connect the diffusion pump, backing pump, vacuum chamber, and other components, controlling the direction and flow of gases.

Power and Control System: Provides power for the diffusion pump, backing pump, and cooling system, managing and operating the entire pump system.

Operating Procedure:

Initial Vacuuming: Start the backing pump to evacuate air from the system to a rough vacuum state, typically between 10⁻¹ and 10⁻³ Torr.

Diffusion Pump Start-Up: Once the pre-vacuum reaches the working range of the diffusion pump, the diffusion pump starts, heating the pump oil to generate vapor and further reduce system pressure.

Maintaining Vacuum: The diffusion pump maintains the system in an ultra-high vacuum state, while the backing pump continues to operate, ensuring efficiency and stability.

Pressure Monitoring and Control: The process is monitored in real-time by pressure sensors to ensure the system stays within the desired vacuum range. The control system automatically adjusts the pump system's operation in case of pressure changes.

Technical Parameters:

Parameter	Unit	Description
Pumping Speed	Liters per second (L/s) or cubic meters per hour (m³/h)	Typically ranges from several hundred to several thousand L/s. Common specifications include 500 L/s, 1000 L/s, 3000 L/s, etc.
Ultimate Pressure	Torr or Pa	The lowest pressure achievable by the system, typically between 10⁻⁶ and 10⁻¹⁰ Torr.
Backing Pressure	Torr or Pa	The initial vacuum level required, typically between 10⁻¹ and 10⁻³ Torr.
Maximum Throughput	mbar·L/s	The maximum gas load the diffusion pump can handle, depending on the type of gas (e.g., hydrogen, nitrogen).
Heater Power	Watts (W) or kilowatts (kW)	The power required for the heater, typically ranging from a few hundred to several thousand watts.
Operating Temperature	°C	The operating temperature of the diffusion pump oil, typically between 180°C and 250°C.
Cooling Requirements	Liters per minute (L/min)	The cooling water flow required to dissipate heat from the diffusion pump, usually between 2-10 L/min, with a water temperature not exceeding 25°C.
Inlet Flange Size	ISO, CF, or KF standard	Sizes range from DN63 to DN200.
Noise Level	Decibels (dB)	Typically between 50-70 dB.
Weight	Kilograms (kg)	Typically ranges from tens to hundreds of kilograms.
Oil Capacity	Liters (L)	Usually ranges from a few liters to several tens of liters.
Vacuum Connection Diameter	Millimeters (mm)	Determined by the system's design.
Power Requirements	Volts (V) and Hertz (Hz)	Typically 220V or 380V, 50Hz or 60Hz.

Applications:

Semiconductor Manufacturing: For processes such as etching and thin-film deposition.

Vacuum Metallurgy: Used for the smelting and heat treatment of high-temperature alloys.

Research: For particle accelerators, ultra-high vacuum experimental equipment, etc.

Electronic Device Production: For manufacturing vacuum tubes, optoelectronic devices, etc.

The diffusion pump system is crucial for achieving and maintaining ultra-high vacuum environments in applications requiring high cleanliness and stability. Its flexible configuration allows it to be customized and adjusted according to specific needs.