Technical Articles
Magnetron sputtering coating is a new physical vapor coating method, compared with earlier evaporation coating method, its many advantages are quite obvious. As a mature technology, magnetron sputtering has been applied in many fields
There are many types of magnetron sputtering. Each has different working principles and application objects. However, they have one thing in common: the interaction between magnetic field and electric field is used to make electrons run in spiral shape near the target surface, thus increasing the probability of electrons striking argon to produce
Sputtering film targets can be roughly divided into mechanical and physical functional films according to their different functions and applications
The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to the substrate under the action of electric field E
Magnetron sputtering coater is characterized by setting up a circular magnetic target on the cathode surface to control the movement of the secondary electrons.
Vacuum coating process is very complex; due to the coating principle is divided into many types, only because of the need for high vacuum and has a unified name. So for different principles of vacuum coating, the factors affecting uniformity are not the same
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