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Target explanation-the principle of vacuum sputtering

Glow discharge is mainly used to impact argon ions on the surface of the target material, and the atoms of the target material are ejected and accumulated on the surface of the substrate to form a thin film. The properties and uniformity of sputtered films are better than those of vaporized films, but the coating speed is much slower than that of v

Principle of vacuum magnetron sputtering coating

In the process of electron flying to the substrate accelerate under the action of electric field, it collides with argon atoms and ionizes a large numbers of argon ions and electrons, and then the electrons fly to substrate. Under the action of electric field, argon ion accelerates to bombard the target

agnetron reactive sputtering insulator

Magnetron reactive sputtering insulator looks easy, but the actual operation is difficult

How to improve the efficiency of sputtering target material

Although increasing the pressure can improve the ionization rate, but at a higher pressure, the chance of collision between the sputtering target particles and gas also increases

What is the principle of sputtering target

Sputtering target is a new physical vapor coating method, which has obvious advantages in many aspects compared with earlier evaporation coating method. As a mature technology, magnetron sputtering has been applied in many fields. The company makes "new concept, new technology, sputtering target new products" and "the pursuit of customer satisfact

Operation process of magnetron sputtering coating target material

The operation process of magnetron sputtering target is not clear to many people, and the work content of magnetron sputtering target is not understood

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