Technical Articles
Although increasing the pressure can improve the ionization rate, but at a higher pressure, the chance of collision between the sputtering target particles and gas also increases
Sputtering target is a new physical vapor coating method, which has obvious advantages in many aspects compared with earlier evaporation coating method. As a mature technology, magnetron sputtering has been applied in many fields. The company makes "new concept, new technology, sputtering target new products" and "the pursuit of customer satisfact
The operation process of magnetron sputtering target is not clear to many people, and the work content of magnetron sputtering target is not understood
Magnetron sputtering coating is a new physical vapor coating method, compared with earlier evaporation coating method, its many advantages are quite obvious. As a mature technology, magnetron sputtering has been applied in many fields
There are many types of magnetron sputtering. Each has different working principles and application objects. However, they have one thing in common: the interaction between magnetic field and electric field is used to make electrons run in spiral shape near the target surface, thus increasing the probability of electrons striking argon to produce
Sputtering film targets can be roughly divided into mechanical and physical functional films according to their different functions and applications
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