Technical Articles
Target poisoning means that the target has reacted and the composition has changed. For example, in the process of TiN, the Ti target reacts with N2 to generate TiN. After the process is completed, there is a layer of TiN on the surface of the Ti target. We call this phenomenon target poisoning
In the 1960s, radio frequency glow discharge was used to prepare thin films of any material from conductors to insulators, so it became popular in the 1970s. DC sputtering is an effective method for making thin films using metal and semiconductor targets. However
Magnetron sputtering includes many types. Each has different working principles and application objects. But there is one thing in common: the interaction between the magnetic field and the electrons makes the electrons spiral around the surface of the target material, thereby increasing the probability of electrons hitting the argon gas to produce
Glow discharge is mainly used to impact argon ions on the surface of the target material, and the atoms of the target material are ejected and accumulated on the surface of the substrate to form a thin film. The properties and uniformity of sputtered films are better than those of vaporized films, but the coating speed is much slower than that of v
In the process of electron flying to the substrate accelerate under the action of electric field, it collides with argon atoms and ionizes a large numbers of argon ions and electrons, and then the electrons fly to substrate. Under the action of electric field, argon ion accelerates to bombard the target
Magnetron reactive sputtering insulator looks easy, but the actual operation is difficult
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