Home > Products > Sputtering Targets
Tantalum Nitride (TaN) Sputtering Targets

Tantalum Nitride (TaN) Sputtering Targets

    Tantalum Nitride (TaN) Sputtering Targets


Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed

Tantalum Nitride (TaN) Specifications

Material Type

Tantalum Nitride

Symbol

TaN

Color/Appearance

Black, Crystalline Solid

Melting Point (°C)

3,360

Theoretical Density   (g/cc)

16.3

Z Ratio

**1.00

Sputter

RF, RF-R

Max Power Density

(Watts/Square Inch)

20*

Type of Bond

Indium, Elastomer

Comments

Evaporate Ta in 10-3 Torr N2.

Material Type

Tantalum Nitride

 


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




Follow Us

Copyright © Zhengzhou CY Scientific Instrument Co., Ltd. All Rights Reserved    Update cookies preferences

| Sitemap |       Technical Support: