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Tantalum (Ta) Sputtering Targets

Tantalum (Ta) Sputtering Targets

    Tantalum (Ta) Sputtering Targets


Tantalum is classified as a transition metal on the Periodic Table and is considered to be one of the refractory metals which are highly resistant to corrosion. Tantalum has a melting point of 3,017°C, a density of 16.6 g/cc, and a vapor pressure of 10-4 Torr at 2,590°C. It is metallic grey-blue in color with strikingly similar chemical properties to niobium. It is mainly used to make surgical implants due to its non-toxic nature. It is also used as a capacitor for electronics and may be alloyed with other metals to add strength and durability. Tantalum, along with its alloys and compounds, is evaporated under vacuum to make semiconductors, optical coatings, magnetic storage media, and wear and corrosion resistant coatings.

Tantalum (Ta) Specifications

Material Type

Tantalum

Symbol

Ta

Atomic Weight

180.9479

Atomic Number

73

Color/Appearance

Gray Blue, Metallic

Thermal Conductivity

57 W/m.K

Melting Point (°C)

3,017

Coefficient of Thermal   Expansion

6.3 x 10-6/K

Theoretical Density   (g/cc)

16.6

Z Ratio

0.262

Sputter

DC

Max Power Density

(Watts/Square Inch)

100*

Type of Bond

Indium, Elastomer

Comments

Forms good films.


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