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RF power supply matching machine for eactive ion etchingRF power supply matching machine for eactive ion etchingRF power supply matching machine for eactive ion etchingRF power supply matching machine for eactive ion etchingRF power supply matching machine for eactive ion etching

RF power supply matching machine for eactive ion etching

    F power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma.

The solid-state RF power supply matching machine adopts the most stable and reliable power amplifier and DC module in current technology, so that the product provides extremely stable RF power output and is more durable. 

The internal integrated matching module adopts the most advanced digital network matching platform. The automatic matching machine matches the complex impedance of the plasma with your desired tuning range in a fast, accurate and repeatable way. Compared with traditional analog tuning methods, digital tuning algorithms and stepper motor drives can produce faster, more accurate and highly repeatable responses, always keeping in line with the impedance point of the load. 

The high quality and small quantity of components maximize the reliability of the product and the life cycle of the equipment. The LCD display has a comprehensive and intuitive operation menu, which can be used directly on the control panel of the equipment, providing unique ease of operation, improving operator efficiency and minimizing training costs. 

RF power supply Technical parameter: 

Frequency

13.56MHZ

Power Range

5-300W

Maximum reflective power

100W

Power factor

>90%

Overall efficiency

≥70%

Power stability

±0.1%

Harmonic components

≤-50 dBc

RF match voltage

AC220V/50-60HZ

Power matching device protection device

DC overcurrent protection, over   temperature protection, reflected power protection, matching time protection

Control mode

Internal control/PLC analog quantity/PC communication

Working voltage

AC220V

The maximum transmission power of the   matcher

500W

Reflected power (at maximum power)

<3W

Maximum load current

30 ARMS

Maximum load voltage

7500VRMS

RF output connector

50 Ω, L29, or can be customized

match time

1-3 S

Matchable impedance real part range

0~80Ω

Matchable impedance imaginary part range

200j~ 200j

Cooling

Forced air cooling

Dimension

133mm (H)×440mm (W)×410mm (D)

Weight

19.5KG

 

Radio frequency power (RF power) has a wide range of applications in many fields. The following are some of the main application areas:

Semiconductor manufacturing: 

RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma.

Thin film deposition: Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films.

Surface treatment: 

RF power plays an important role in material surface modification, etching, cleaning, etc., such as optical coating, coating, surface etching, glass and ceramic processing.

Medical equipment:

RF power is also used in some medical equipment, such as radio frequency ablation technology for the treatment of arrhythmias and tumors.

Plasma cutting and welding:

In metal processing, RF power is used in plasma cutting and welding processes to provide energy for the plasma arc.

Communication equipment: 

In the fields of radio transmitters, antenna tuning, electromagnetic compatibility testing, etc., RF power provides the necessary signal power.

Material processing: 

including fiber preform manufacturing, synthetic diamond, nanomaterial preparation, etc. RF power is used to drive plasma reactors.

These application areas demonstrate the importance of RF power in modern industry, especially in areas involving precision manufacturing and material processing.


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  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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