RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma
RF series power is used in the application of low power, line applications.It is compact, lightweight and air-cooled design. Radio frequency power supply and auto matching device are integrated.High quality components and less components will realize optimization of the reliability and product life cycle.I will maximize the use of your investment and process productivity. An intuitive and quick menu (in the function of the component on the front panel switch, and displayed on the LCD screen with a 128 x 64 pixel on) to bring the convenience of incomparable -- has a variety of frequency selection (2M, 4M, 13.56M, 27.12M, 40.68MHz).
Main functional features | |
Power range | 0-100W/0-150W |
Frequency | 13.56MHZ |
Matching mode | manual |
Transmission efficiency | >90% |
Power stability | ≦2W |
Reflection power( maximum) | <2W |
Mismatch Power output | Depending on actual load impedance |
Harmonic(dBc) | ≤-50 |
Matching time | 3-5S |
Power adapter protection Settings | Overheat protection,Over-current protection,DC overload protection, |
Control mode | Introcontrol/PLC analog/PC communication |
Voltage | AC 220V |
RF input connector | UHF male connector |
Matched impedance real range | 0-88Ω(adjustable) |
Matched impedance imaginary range | -j200----+j200(adjustable) |
Cooling way | air |
Radio frequency power (RF power) has a wide range of applications in many fields. The following are some of the main application areas:
Semiconductor manufacturing:
RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma.
Thin film deposition:
Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films.
Surface treatment:
RF power plays an important role in material surface modification, etching, cleaning, etc., such as optical coating, coating, surface etching, glass and ceramic processing.
Medical equipment:
RF power is also used in some medical equipment, such as radio frequency ablation technology for the treatment of arrhythmias and tumors.
Plasma cutting and welding:
In metal processing, RF power is used in plasma cutting and welding processes to provide energy for the plasma arc.
Communication equipment:
In the fields of radio transmitters, antenna tuning, electromagnetic compatibility testing, etc., RF power provides the necessary signal power.
Material processing: including fiber preform manufacturing, synthetic diamond, nanomaterial preparation, etc. RF power is used to drive plasma reactors.
These application areas demonstrate the importance of RF power in modern industry, especially in areas involving precision manufacturing and material processing.
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