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Compact 100W RF Generator with Matching NetworkCompact 100W RF Generator with Matching NetworkCompact 100W RF Generator with Matching NetworkCompact 100W RF Generator with Matching NetworkCompact 100W RF Generator with Matching Network

Compact 100W RF Generator with Matching Network

    RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma

RF series power is used in the application of low power, line applications.It is compact, lightweight and air-cooled design. Radio frequency power supply and auto matching device are integrated.High quality components and less components will realize optimization of the reliability and product life cycle.I will maximize the use of your investment and process productivity. An intuitive and quick menu (in the function of the component on the front panel switch, and displayed on the LCD screen with a 128 x 64 pixel on) to bring the convenience of incomparable -- has a variety of frequency selection (2M, 4M, 13.56M, 27.12M, 40.68MHz).

RF power supply Technical parameters:

Main functional features

Power range

0-100W/0-150W

Frequency

13.56MHZ

Matching mode

manual

Transmission efficiency

>90%

Power stability

2W

Reflection power( maximum)

<2W

Mismatch Power output

Depending on actual load impedance

Harmonic(dBc)

≤-50

Matching time

3-5S

Power adapter protection Settings

Overheat protection,Over-current   protection,DC overload protection,

Control mode

Introcontrol/PLC analog/PC communication

Voltage

AC 220V

RF input connector

UHF male connector

Matched impedance   real range

0-88Ω(adjustable)

Matched impedance imaginary range

-j200----+j200(adjustable)

Cooling way

air

Radio frequency power (RF power) has a wide range of applications in many fields. The following are some of the main application areas:

Semiconductor manufacturing:

 RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma.

Thin film deposition: 

Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films.

Surface treatment: 

RF power plays an important role in material surface modification, etching, cleaning, etc., such as optical coating, coating, surface etching, glass and ceramic processing.

Medical equipment: 

RF power is also used in some medical equipment, such as radio frequency ablation technology for the treatment of arrhythmias and tumors.

Plasma cutting and welding:

 In metal processing, RF power is used in plasma cutting and welding processes to provide energy for the plasma arc.

Communication equipment:

 In the fields of radio transmitters, antenna tuning, electromagnetic compatibility testing, etc., RF power provides the necessary signal power.

Material processing: including fiber preform manufacturing, synthetic diamond, nanomaterial preparation, etc. RF power is used to drive plasma reactors.

These application areas demonstrate the importance of RF power in modern industry, especially in areas involving precision manufacturing and material processing.

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  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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