40KHz Medium frequency power supply for Etching

The 40KHz Medium frequency power supply provides a 40kHz resonant switch mode output power with enhanced protection mechanisms, and its internal load matching output can provide 5KW to 15kW. This combined unit does not require external hardware such as a transformer. The power supply can be unipolar output and bipolar (floating) output, which can be grounded on either side. The 40KHz IF power supply adopts a water-cooled design and provides strict output regulation of power, voltage or current, with a measurement accuracy of 1% and low harmonics. The 40KHz power supply is compatible with programmable logic controllers (PLC) and meets CE specifications.

 power supply Product Features:

High power density: 40KHz medium frequency power supply has an output power factor greater than 0.9 and has the characteristics of compact structure and wide impedance matching;

Wide range of use: 40KHz medium frequency power supply voltage range allows continuous operation in an impedance range of nearly 10:1;

Continuous control operation: three control modes: constant load power, constant load voltage, constant load current;

Enhanced arc control: current arc circuit, voltage arc circuit;

Built-in protection: 40KHz medium frequency power supply has internal overvoltage, overcurrent, overload, open circuit and short circuit protection functions. Users are allowed to add inputs such as vacuum, water and system interlocking;

Flexible modular design: 40KHz medium frequency power supply has the characteristics of small size;

Fully enclosed heat dissipation design: The chassis adopts a fully enclosed design to avoid exchange of gas with the outside world. It has strong adaptability to environments such as dust and salt spray, and prolongs service life.

 power supply Technical parameters:

Radio frequency power (RF power) has a wide range of applications in many fields. The following are some of the main application areas:

Semiconductor manufacturing: RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma.

Thin film deposition: Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films.

Surface treatment: RF power plays an important role in material surface modification, etching, cleaning, etc., such as optical coating, coating, surface etching, glass and ceramic processing.

Medical equipment: RF power is also used in some medical equipment, such as radio frequency ablation technology for the treatment of arrhythmias and tumors.

Plasma cutting and welding: In metal processing, RF power is used in plasma cutting and welding processes to provide energy for the plasma arc.

Communication equipment: In the fields of radio transmitters, antenna tuning, electromagnetic compatibility testing, etc., RF power provides the necessary signal power.

Material processing: including fiber preform manufacturing, synthetic diamond, nanomaterial preparation, etc. RF power is used to drive plasma reactors.

These application areas demonstrate the importance of RF power in modern industry, especially in areas involving precision manufacturing and material processing.