2000W RF power supply For plasma enhanced chemical vapor depositio

2000W RF power supply For plasma enhanced chemical vapor depositio

Thin film deposition: Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films.

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Advanced and multifunction platform offers exceptionally stability RF power-delivery performance, as well as a diverse selection of models, each with a unique set of features(13.56MHz; 0.1 to 1 kW; with a variety of user interfaces). This enables you to choose a unit suited specifically to your application

High-quality components and a low part count maximize reliability and product lifetime, making

the most of your investment and your process productivity. Highly intuitive, fast operating menus

(change on the unit’s front panel and displayed on a large 192x64 LCM) will provide unparalleled

ease—increasing operator efficiency and minimizing training costs.

Benefits

Increased process uptime

Enhanced operational ease and flexibility

Customized performance without custom-unit lead times

Ease of use and cost savings

High quality service and support

Features

Simple, reliable design

Standard platform packaging

High efficiency—less heat generated

RS-232,RS-485 and user analog interface

Specific interface for match

Multifunction front panel

Intuitive LCD display and, operating menu

RF power supply Technical Parameter:

signal frequency	13.56MHz±0.005%
Power output range	5W-500W	5W-1000W	10-2000W
Maximum reflected power	100W	200W	400W
RF output interface	N-type
power stability	±0.1%
Harmonic component	≤-50dbc
supply voltage	Single-phase AC (187V-253V) Frequency 50/60HZ
Operating ambient temperature	-10 ℃ -40 ℃
Communication interface	DB15/DB25 analog interface, RS485/RS232
cooling method	Forced air cooling		Air+water cooling
Total Weight	19.5kg		26kg
Overall size	88x483x500mm(HxWxD)		132x483x500mm(HxWxD)

Radio frequency power (RF power) has a wide range of applications in many fields. The following are some of the main application areas:

Semiconductor manufacturing: RF power is widely used in plasma enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), magnetron sputtering and other processes in the semiconductor manufacturing process to generate and maintain plasma.

Thin film deposition:

Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films.

Surface treatment:

RF power plays an important role in material surface modification, etching, cleaning, etc., such as optical coating, coating, surface etching, glass and ceramic processing.

Medical equipment:

RF power is also used in some medical equipment, such as radio frequency ablation technology for the treatment of arrhythmias and tumors.

Plasma cutting and welding:

In metal processing, RF power is used in plasma cutting and welding processes to provide energy for the plasma arc.

Communication equipment: In the fields of radio transmitters, antenna tuning, electromagnetic compatibility testing, etc., RF power provides the necessary signal power.

Material processing:

including fiber preform manufacturing, synthetic diamond, nanomaterial preparation, etc. RF power is used to drive plasma reactors.

These application areas demonstrate the importance of RF power in modern industry, especially in areas involving precision manufacturing and material processing.