13.56MHz High Power RF Power Supply for PECVD

13.56MHz High Power RF Power Supply for PECVD

13.56MHz High Power RF Power Supply has a wide range of applications in many fields. The following are some of the main application areas:Including magnetron sputtering, plasma enhanced chemical vapor deposition, plasma polymerization and other technologies, RF power is used to excite gas to form plasma, thereby promoting the deposition of thin films

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Power supply with high reliability for plasma vacuum system

The power output of this power supply can reach 2500W to 5000W, frequency 13.56MHz, standard sine wave. This series of power supplies has the advantages of high power output accuracy, stability and repeatability. Its solid-state design makes the product low-priced and highly reliable. The power supply uses a large-screen LCD display: set power, incident power, reflected power, status and other parameters, and can also display the operating parameters of the matcher and operate the RF matcher through the power supply panel.

Application field:

This power supply can be used as a power supply for RF-driven plasma systems, which can be used in the semiconductor industry. Application objects include: etching, RIE, parallel plate, ICP, magnetron sputtering, CVD, PVD, plasma cleaning and PECVD systems.

RF Power Supply Technical Parameters:

Product specifications	2500W	4000W	5000W
Output power	0-2500W	0-4000W	0-5000W
Working stability	≤±0.5%
Output frequency	13.56MHz
Frequency signal	Standard sine wave
Input voltage	AC380V（AC220V)	AC380V 3PH
Input current	8A(16A）	20A
Output impedance	50Ω
Standing wave ratio	＞3.0
Cooling method	Water Cooling
Communication port	RS232/RS485 Standard Modbus
Analog control interface	DB15
Output interface	N/UHF	N or 7/16
Chassis size	440x445x130mm Standard 3U	440x500x130mm Standard 3U
Panel size	480x133mm
Weight	25kg	28kg