300W 2L plasma cleaning machine CY-P2L-300W

300W 2L plasma cleaning machine CY-P2L-300W

Plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.

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2L plasma cleaner is equipped with a mechanical vacuum pump, while vacuuming maintains the vacuum of the chamber, the pollutants after the plasma reaction can also be pumped away by the vacuum pump; therefore, the short-time cleaning can completely clean the organic pollutants.

In addition to the cleaning function, this small plasma cleaner can change the surface properties of some materials according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaner not only enhances the adhesion, compatibility and wettability of these materials, but also disinfects and sterilizes the materials.

This plasma cleaner is suitable for laboratory and small-scale production. Using 13.56Mhz rf power supply, can be used to match a variety of commonly used gas plasma. There are a variety of common specifications for RF power supply from 100W to 1000W, which can meet the diverse needs of users.

plasma cleaner

2L plasma cleaning machine technical parameters:

Main parts	Item	Parameters
Cleaning the chamber	Chamber material	High purity quartz
Cleaning the chamber	Chamber size	Diameter 100 mm; Length 270 mm
RF power supply	Power supply features	The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively ensures the RF power output of the power supply. High quality electronic components are used to ensure the reliability of the products.
	Power advantage	● Long time normal operation ● Simple and flexible operation ● High power supply efficiency and low heat generation ●With perfect reflection power protection function
	RF power	0~300W continuously adjustable
	Signal frequency	13.56MHz ±0.005%
	Reflected power	≤100W
	Power stability	±0.1%
	RF connector	N type connector
	Machine efficiency	≥75%
	Harmonic component	≤-50 dBc
	cooling method	Forced air cooling
Gas measurement	Measuring unit	Float flowmeter
	Gas channel	Two channels
	A channel range	10～100ml
	B channel range	16～160ml
Vacuum	Vacuum measurement	Digital vacuum gauge (resistance gauge)
	Vacuum pump	Two-stage rotary vane vacuum pump
	Motor speed	50 Hz: 1440; 60 Hz: 1720
	Pumping rate	50 Hz: 1.1L/s; 60 Hz: 1.3L/s
	Vacuum range	0.1Pa～10000Pa
	Ultimate vacuum	0.5Pa
	Motor noise	≤56dB
	Pipe interface	Gas inlet: KF16; exhaust port KF16.
	Connecting pipe	KF16 vacuum bellows
	Vacuum valve	Solenoid valve
	Motor Power	400W
Other	Power supply	AC220V 50/60Hz
	Total power	800W
	Operating temperature	-10℃-40℃
	Working vacuum	≤40Pa
	Overall size	540mm×650mm×440mm
	Total Weight	58kg (including packaging)

2L plasma cleaning machine applications:

Metal: remove oil, greasy dirt and other organic matter and oxide layer on the metal surface;

Automotive manufacturing: used for pre-treatment of plastics and paint spraying in automotive manufacturing processes;

Textile production: used for the hydrophilicity, hydrophobicity and surface modification of textiles, filter screens and films;

Biomedicine: Petri dishes enhance activity, vascular stents, syringes, catheters and pro-wetting of various materials, before cross-coating treatment;

Aerospace: surface coating pretreatment of insulating materials, electronic components, etc.;

Electronics: circuit board cleaning and etching. Non-oxidation and activation treatment of PP and other materials, to improve solderability;

Semiconductor industry: wafer processing and processing to remove photoresist, pre-package pretreatment;

LED: Pre-treatment before the bracket is cleaned and packaged;

Plastic rubber: Improve the surface activity of PS, PE, PTFE, TPE, POM, AS and PP, making it easy to bond and print.

plasma cleaner applications

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