This equipment is a plasma-enhanced rotating graphene preparation system. The equipment is composed of a rotating and tilting mechanism, a single heating zone tube furnace, a plasma generator, a mass flow meter gas delivery system, and a high vacuum molecular pump unit.
This equipment is a plasma-enhanced rotating graphene preparation system. The equipment is composed of a rotating and tilting mechanism, a single heating zone tube furnace, a plasma generator, a mass flow meter gas delivery system, and a high vacuum molecular pump unit. Compared with other graphene preparation equipment, this equipment can provide a higher background vacuum, which can improve the quality of the product; it can use the rotation and tilt mechanism to achieve continuous production, and can make the surface of the particle sample grow products evenly; the plasma generator can significantly reduce the reaction temperature and improve the reaction efficiency.
Single heating zone tube furnace | Product model | CY-O1200-100IT | |
Furnace tube material | High purity quartz | ||
Tube diameter | 100mm | ||
Furnace tube length | 1500mm | ||
Furnace chamber length | 440mm | ||
Heating zone length | 400mm | ||
Constant temperature zone head | 200mm | ||
Operating temperature | 0~1100℃ | ||
Temperature control accuracy | ±1℃ | ||
Temperature control mode | 30 or 50 segment program temperature control | ||
Display mode | HD full color LCD touch screen | ||
Sealing method | 304 stainless steel vacuum flange | ||
Power supply | AC: 220V 50/60Hz | ||
RF output system | Power range | 0~500W adjustable | |
working frequency | 13.56MHz+0.005% | ||
Working mode | Continuous output | ||
Matched impedance mode | It can be matched, and the glow is evenly distributed throughout the furnace tube | ||
Power stability | ≤2W | ||
Normal working reflected power | ≤3W | ||
Amplified reflected power | ≤70W | ||
Harmonic component | ≤-50dBc | ||
Overall efficiency | ≥70% | ||
Power factor | ≥90% | ||
Supply voltage/frequency | Single-phase AC (187V~153V) frequency 50/60Hz | ||
Control mode | Internal control/PLC analog quantity/RS232/485 communication | ||
Power protection settings | DC over current protection, power amplifier over temperature protection, reflected power protection | ||
Cooling method | Forced air cooling | ||
Glow zone | Under Ar, the radio frequency power supply and the coil cooperate with the glow to fill the furnace tube | ||
Gas delivery system | Flowmeter | Four-channel mass flowmeter | |
Flow range | MFC1 range: 0~200sccm MFC2 range: 0~200sccm MFC3 range: 0~500sccm MFC4 range: 0~500sccm Corresponding to gases H2, CH4, N2, Ar. | ||
Measurement accuracy | ±1.5%F.S | ||
Repeatability | ±0.2%FS | ||
Linear accuracy | ±1%F.S. | ||
Response time | ≤4s | ||
Work pressure | -0.15Mpa~0.15Mpa | ||
Flow control | LCD touch screen control, digital display, each channel gas contains needle valve for individually control. | ||
Intake interface | It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe | ||
Outlet interface | It can be connected with 1/4NPS or 6mm outer diameter stainless steel pipe | ||
Connection method | Double ferrule connector | ||
Operating temperature | 5~45℃ | ||
Gas premix | Equipped with gas premixing device | ||
Exhaust system | Product model | CY-GZK103-A | |
Molecular pump | Turbomolecular pump | ||
Backing pump | Two-stage rotary vane pump | ||
Pumping rate | Molecular pump: 600L/S | Comprehensive pumping performance: 30 minutes vacuum can reach: 5×10E-3Pa | |
Rotary vane pump: 1.1L/S | |||
Ultimate vacuum | 5×10E-4Pa | ||
Pumping port | KF40 | ||
Exhaust interface | KF16 | ||
Vacuum measurement | Compound vacuum gauge | ||
Rotating and tilting device | Speed range | 0-20rpm | |
Tilt angle | 0-15° | ||
Material feeding and receiving system | Automatic feeding, automatic collection after tilting |
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