Application
1.Regional refinding for semiconductor of germanium and silicon
2.CVD experiment
3.Preparation of carbon nanotubes
4.Growth of graphene
5.Crystalline silicon substrate coating
6.Diffusion welding for metal materials
7.Heat treatment under the vacuum of atmosphere surroundings
Features
1.Fast heating and cooling, maximum rate: 0-100°c/min
2.Multi-function: CVD experiment, growth of graphene, crystalline silicon substrate coating,etc.
3.LED display or LCD touch screen
4.Slide type, can manual sliding or electric sliding
5.Can connect with vacuum pump and atmosphere furnace.
Model | CY-T1200-80IC |
Display | LED |
Limiting temperature | 1200℃ |
Working temperature | ≤1200℃ |
Heating rate | Suggestion 0~20℃/min |
Temperature zone | Single |
Temperature accuracy | ±1℃ |
Chamber size | Φ80×1200(mm) |
Heated length | 440mm |
Furnace structure | High purity Al2O3 insulation chamber |
Cooling fans are installed at the | |
Sliding flange assembly are made of stainless steel. | |
Heating element | Imported alloy heating wire |
Thermal couple | K Type |
Rated power | 1.5 Kw |
Temperature control | PID automatic control via SCR power control |
Chamber material | Alumina Fiber |
Flange connection | Stainless steel flange |
Sliding Rail | 800mm long sliding rail is installed with one |
Mass Flow meters | Three precision mass flow meters (0.02% accuracy) with |
MFC 1: Gas flow range from 0~100 sccm | |
MFC 2 : Control range from 0~200 sccm | |
MFC 3 : Control range from 0~200 sccm | |
Flowing rate accuracy: ±1% FS | |
Each gas channle has a SS needle valve for easy on/off | |
The flow rate is adjustable from the MFC panel | |
Vacuum pump and valve | Pumping rate: 8m3/h 50Hz; 9.6m3/h 60Hz. |
Vacuum degree:10Pa | |
KFD25 adapter and stainless steel pipe are connected | |
Working voltage | AC110-480V 50/60 Hz |
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