This compact cvd system is composed by a mini tube furnace, a rotary vacuum pump, a 3 gas way float flow controller and a digital vacuum gauge. This compact cvd system is widely used in laboratory thin film preparation, such as MoS2, graphene etc.
Furnaceparameters | FurnaceConstruction | •Highpurityceramicfiberinsulation(energysaving30%andweight lighterabout30%thanoldfurnace). •Doublelayerssteelcasingwithfancooling,toensurethe surfaceoffurnacebelow50°C. •Perfectsealingstainlesssteelflangewithblock. |
ChamberSize | Φ50*1000mm,Φ60*1000mm,Φ80*1000mm,Φ100*1000mm orascustomized | |
Power | 0.8KW~10KW,baseontheheatingzonelength | |
Voltage | AC220V50/60Hz | |
Max.Temperature | 1200°C(<2hour) | |
ContinuousWorkTemp. | 1150°C | |
Max.HeatingRate | 20°C/min | |
TemperatureController | •PIDautomaticcontrolandauto-tunefunction. •30programmablesegmentsforprecisecontrol. •Over-heatedandbrokenThermalcouple. •DigitalcontrolpanelLEDbuttonorLCDtouchscreen | |
TemperatureAccuracy | +/-1°C | |
HeatingElement | Aludirome | |
ThermalCouple | Ktype | |
VacuumPump | ·AC220V50Hz1/2HP375W ·2Liter/Sor120liter/m ·Oiltrap(inlet)andexhaustfilter(outlet)areinstalled. ·Max.vacuum:10-2torr | |
Float Flow Control | 3 gas way 16~160,25~250,60~600ml/min as customized | |
Warranty | Oneyearlimitedwarranty(Consumablepartssuchasthermocouple,doorblockandheatingelements |
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