This CVD system is specially designed for graphene production, using a 1200℃ mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge.
This CVD system is specially designed for graphene production, using a 1200℃ mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge. Compared with the conventional Pirani resistance gauge, the reading of the thin film gauge is accurate and not affected by the type of gas, which is very suitable for the vacuum coating process. At the same time, the equipment is equipped with a combustible gas detection device, which is linked with a solenoid valve at the air outlet. Once there is a leakage, the solenoid valve can be closed to ensure safety.
This set of equipment has a small footprint and is very suitable for laboratory preparation of CVD.
1200℃ Mini Tube Furnace Parameters: | |
Supply voltage | AC220V, 50Hz |
Maximum power | 2KW |
Heating zone | Single heating zone 200mm |
Constant temperature zone length | 100mm |
Heating element | Heat-resistant alloy wire |
Thermocouple | K type |
Operating temperature | ≤1150℃ |
Heating rate | Suggest ≤10℃/min |
Temperature control accuracy | ±1℃ |
Temperature control method | AI-PID 30-segment process curve, with overheat and burnout protection |
Furnace tube material | High purity quartz |
Furnace tube size | φ50mm O.D x 450mm L |
Vacuum pump | Mechanical pump, pumping speed 1.1L/s |
Ultimate vacuum | 5Pa |
Three-channel mass flow meter parameters: | |
Valve type | Stainless steel needle valve |
Number of gas paths | Three |
Pressure range | 0.05~0.3MPa |
Range | Ar 0~500sccm H2 0~200sccm CH4 0~10sccm |
Flow control range | ±1.5% |
Mixing tank volume | 750mL |
Gas path material | 304 stainless steel |
Pipe interface | 6.35mm ferrule connector |
Power supply | AC220V 50Hz |
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