The coating equipment is mainly based on metal/organic source evaporation. It is suitable for the preparation of metal elements, oxides, dielectrics, semiconductor films, etc
I. Equipment performance:
The coating equipment is mainly based on metal/organic source evaporation. It is suitable for the preparation of metal elements, oxides, dielectrics, semiconductor films, etc. in the laboratory. It can also be used for teaching and pre-process testing of production lines. , the expansion space is large, suitable for and meet the teaching and research work of colleges and universities.
II. The basic structure:
The coating equipment consists of vacuum chamber, metal/organic source system, sample stage system, vacuum pump set, film thickness monitor system, equipment rack, and electronic control system. The front door of the vacuum chamber can be connected to the glove box, and an integrated design scheme is adopted. The whole set of equipment is compact in structure and simple in layout, so as to avoid the messy appearance of experimental equipment.
III. Technical parameters:
1.Vacuum Chamber | ||
Appearance | 1 set of high-quality 304 stainless steel D-shaped vacuum chamber, the internal size of the vacuum chamber is D400*480mm, the front and rear double doors, and the rear door adopts a hinged square door, which is convenient for cleaning the vacuum chamber, internal debugging, maintenance and pick-and-place samples; The front door adopts horizontal pull square door, and each front and rear door is equipped with 1 set of DN100 windows; | |
Bottom | 2 sets of metal source interfaces, 4 sets of organic source interfaces, 1 set of molecular pump interface, 2 sets of lighting interfaces and 3 sets of film thickness probe interfaces; | |
Top | 1 set of sample stage interface, 1 set of electric baffle interface, 1 set of high vacuum pneumatic baffle valve interface; | |
Left side | 1 set of high vacuum pneumatic flapper valve interface. | |
2.Metal/Organic Source System | ||
Metal source | Quantity: 2 sets 2 sets of water-cooled copper electrodes, compatible with evaporation boats (tungsten, molybdenum and tantalum boats) and spiral wires, equipped with pneumatic baffles, 1 set of 1KW DC constant current power supply (digital display), current adjustment accuracy 1A (fine adjustment), the power meets common Evaporation of metals and metal oxides; | |
Organic source | Quantity: 4 sets 4CC quartz boat, 2 temperature control power supplies (temperature control meter display accuracy 0.1°C), temperature range: RT~500°C (temperature control accuracy ±1°C), with pneumatic baffle; | |
Baffle | The evaporation source is independent from each other, and the baffle is separated to avoid cross contamination | |
3.Sample Stage System | ||
Substrate rotation | The speed is continuously adjustable from 0 ~ 30 rpm; | |
Substrate lifting | Electric lifting, the distance between the substrate and the evaporation source is 200~300mm continuously adjustable through the touch screen; | |
Sample holder | 20*20mm substrate 8 pieces | |
Substrate shutter | Electric shutter | |
4.Vacuum System | ||
Vacuum pump set | 1) 1 set of 600L/s molecular pump; 2) 1 set of 8L/s rotary vane pump 3) 1 set of CF150 high vacuum pneumatic gate valve; 4) 1 set of CF40 high vacuum pneumatic flapper valve; 5) 2 sets of KF16 high vacuum pneumatic flapper valves; 6) 1 set of KF40 high vacuum pneumatic flapper valve; 7) 1 set of KF40 vacuum solenoid valve; 8) 2 sets of KF40 pump valve connecting hoses, 1 set of KF40 tee; 9) 1 set of digital vacuum gauge (measurement range: 1×105~1×10-5Pa) | |
5.Film Thickness Monitor System | ||
Film thickness meter | 1 set of three-channel quartz crystal film thickness monitor | |
Film thickness probe | 3 sets of CF35 water-cooled film thickness probe | |
6.Equipment Rack | ||
1) 1 set of 40 carbon steel square tube welding frame; 2) 4 pieces of universal wheels, move and adjust; 3) 4 pieces of M16 feet, locked and positioned. | ||
7.Electronic Control System | ||
Power supply of metal source | 1 set | |
Power supply of organic source | 2 sets (one for two) | |
Evaporation source baffle power supply | 1 set | |
Three-channel quartz crystal film thickness monitor | 1 set | |
Sample table and its baffle power supply | 1 set | |
Baking lighting power supply | 1 set | |
PLC control | 1 set, equipped with touch screen | |
Total control power supply | 1 set | |
8. Single Working Station Glove Box (With removable left side, no gas purification system and analyzers) | ||
Chamber size | L1200* W750* H900mm | |
Gloves | 1 pair | |
Large antechamber | Inner diameter 360mm, length 600mm | |
Small antechamber | Inner diameter 150mm, length 300mm | |
9.Other Parameters | ||
1) Phase loss protection, misoperation protection, linkage interlock and one-key vacuum start and stop functions; 2) Power supply: ~220V two-phase power supply system (peak 3KW); 3) Water supply: small chiller, cooling water temperature 5℃~35℃, working environment temperature: 10℃~40℃; 4) Air supply: small oil-free silent air pump, providing 0.2-0.3MPa air pressure to drive pneumatic valves; 5) Ultimate vacuum: 6×10-5Pa, the time from atmosphere to 6×10-4Pa is less than 35 minutes (fill with dry nitrogen), shut down for 12 hours vacuum degree≤10Pa. |
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