Home > Products > Magnetron Sputter coating
Single target magnetron sputtering coater with tiltable sample stageSingle target magnetron sputtering coater with tiltable sample stageSingle target magnetron sputtering coater with tiltable sample stage

Single target magnetron sputtering coater with tiltable sample stage

    This equipment is a single-target magnetron sputtering coater with a tiltable sample stage. The angle between the sample stage and the target surface is adjustable, and it can be used to make films with specific growth angles. The appearance of the equipment is desktop level, which greatly reduces the installation site requirements. 

This equipment is a single-target magnetron sputtering coater with a tiltable sample stage. The angle between the sample stage and the target surface is adjustable, and magnetron sputtering coater can be used to make films with specific growth angles. The appearance of the equipment is desktop level, which greatly reduces the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering of metal and other conductive materials. The vacuum system of the equipment adopts turbomolecular pump group, which has fast pumping speed, high ultimate vacuum degree and excellent vacuum performance. This equipment has a compact structure and perfect functions and is easy to use, and is very suitable for various coating tests.

magnetron sputtering coater technical parameters:

product name

single target magnetron sputtering coater   with tiltable sample stage

Product number

CY-MSZ180-60Q-I-DC-Q

sample stage

Dimensions

φ60mm

Heating temperature

500

Adjustable speed

20rpm

Magnetic target gun

Equipped with a two-inch magnetic control   target, target size: diameter 50.8mm, thickness 3mm

vacuum chamber

Cavity size

φ180mm X150mm

observation window

omnidirectionally transparent

Cavity material

High purity quartz

Lower flange

Contains sample stage tilt mechanism and   rotation mechanism

Opening method

Removable top cover

Vacuum system

Backing pump

Low noise bipolar rotary vane pump

Molecular pump

Low noise and high pumping speed   turbomolecular pump

Vacuum measurement

Composite vacuum gauge, range: 10-5~105Pa

Air extraction interface

KF16

Air extraction interface

KF40

Exhaust interface

KF16

System vacuum

1.0×10-4Pa

Power supply

AC 220V 50/60Hz

Pumping rate

The pumping speed of the molecular pump   is 600L/s, and the pumping speed of the backing pump is 1.1L/s.

Power configuration

Number of power supplies

A set of DC power supply

Output Power

300W

Other parameters

Supply voltage

AC220V,50Hz

Total power

2kW

Overall size

550mm X 350mm X400mm

magnetron sputtering coater video:

Disclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will periodically improve and modify the website information, without prior notice, please understand.

Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




Follow Us

Copyright © Zhengzhou CY Scientific Instrument Co., Ltd. All Rights Reserved    Update cookies preferences

| Sitemap |       Technical Support: