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Single target DC magnetron sputtering coater for oxide  filmSingle target DC magnetron sputtering coater for oxide  filmSingle target DC magnetron sputtering coater for oxide  film

Single target DC magnetron sputtering coater for oxide film

    Single target DC magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic  film,  dielectric film, optical film, oxide  film,  hard  film,polytetrafluoroethylene  film and so on

Introducing our Single Target DC Magnetron Sputtering Coater, the ultimate solution for all your film preparation needs. This professional-grade equipment is designed to deliver exceptional performance and precision, making it the ideal choice for a wide range of applications.


With our Single Target DC Magnetron Sputtering Coater, you can effortlessly prepare single or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, and even hard films. This versatility ensures that you can achieve the desired results for various materials and coatings.


Equipped with advanced technology, our coater guarantees outstanding efficiency and reliability. The magnetron sputtering process ensures uniform and controlled deposition, resulting in high-quality films with excellent adhesion and uniform thickness. This ensures consistent and reproducible results, meeting the highest industry standards.


Our Single Target DC Magnetron Sputtering Coater is designed with the utmost precision and attention to detail. The user-friendly interface allows for easy operation and control, while the robust construction ensures long-lasting performance. Additionally, the equipment is equipped with safety features to ensure a secure working environment.


Invest in our Single Target DC Magnetron Sputtering Coater and elevate your film preparation capabilities to new heights. Experience the power of advanced technology combined with professional-grade performance. Trust in our equipment to deliver exceptional results, every time.

Specification parameters:

 

Single   target DC magnetron sputtering coater

Sample

Table

Overall dimensions

Φ 360 mm

Adjustable RPM

1-20rpm adjustable

Magneto-c ontrolled

target

gun

Target plane

Circular plane target

Sputtering vacuum

0.1Pa to 3Pa

Target diameter

100 to 101.6mm

Target thickness

3mm

Insulation voltage

>2000V

Cable specifications

SL-16

 


Target head temperature

≦ 65 ℃

Vacuum

chamber

Inner wall treatment

Electrolytic polishing

Cavity size

Φ500mm x 500mm

Cavity material

304 stainless steel

Viewing window

Quartz window, φ100mm diameter

Opening method

Side opening

Gas

control

Flow control

Mass flowmeter, measuring range 0 ~   100SCCM

Gas type

Argon, nitrogen, oxygen and other gases   are

available

Regulator Valve Types

Solenoid Regulator

Static state of regulator valve

Normal close

Measuring linearity

Plus or minus 1.5% F.S

Measurement

repetition accuracy

Plus or minus 0.2% F.S

Measure response time

≤8 seconds (T95)

Range of working

pressure difference

0.3 MPa

Pressure resistant body

3MPa

Working ambient temperature

(5 ~ 45) ℃

Body material

Stainless steel 316L

Leakage rate of body

1×10-8Pa.m3/s

Pipe fittings

1/4 "jacketed joints

Input/output signals

0 to 5V

Power supply

±15V (±5%) (+15V 50mA, -15V 200mA)

Overall dimensions mm

130 (W) x 102 (H) x 28 (H)

Communication interface

RS485 MODBUS protocol

DC power

supply

Power supply

1500W

 

 

 

 

Film

thickness

measureme

nt

Power requirements

DC:5V (±10%) Maximum current 400mA

Resolution

±0.03Hz(5-6MHz), 0.0136A/measurement (aluminum)

Measurement accuracy

±0.5% thickness +1 count

Measurement cycle

100mS ~ 1S/ time (can be set)

Measuring range

500,000 A (aluminum)

Crystal frequency

6MHz

Communication interface

RS-232/485 serial interface

Display bits

8-bit LED display

Molecular

pump

Molecular pumping speed

1200L/S

Rated speed

24000rpm

Vibration value

≦ 0.1 um

Start-up time

5min

Downtime

7min

Cooling method

Water cooling + air cooling

Cooling water temperature

≦37℃

Cooling water flow rate

1L/min

Mounting direction

Vertical ±5

Air extraction interface

150CF

Exhaust port

KF40

Front

pump

Pumping rate

VRD-16

Ultimate vacuum

1Pa

Power supply

AC:220V/50Hz

Motor power

400W

Noise

56db

Air extraction interface

KF40

Exhaust port

KF25

Valve

Gate valve

A gate valve is arranged between the   vacuum

chamber and the molecular pump

Cut-off valve

A cut-off valve is installed between the

molecular pump and the front stage

Side drain valve

A side drain valve is installed between   the

vacuum chamber and the front stage

Bleeder valve

An electromagnetic bleeder valve is   installed

on the vacuum chamber

Ultimate vacuum of the whole

machine

5X10-4Pa

Test target

1 piece of nickel target 4 inches in   diameter

and 3mm thick

 


 

 

 


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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