Dual-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Dual-target DC magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Dual-target DC magnetron sputtering coater technical parameters:
product name | Dual-target DC magnetron sputtering coater |
Sputtering power supply | DC power supply×2 DC power supply：500W |
Vacuum chamber | Chamber size：φ300mm×300mm，Chamber materia：Stainless steel Watch window： φ100mm The cavity opening method adopts top opening, which makes it easier to change the target |
Magnetron Sputtering target head | There are 2 magnetron sputtering heads installed in the instrument, and they are all equipped with a water-cooled interlayer, which can pass in cooling water to cool the target material. The two sputtering heads are connected with a DC power supply, and the main sputtering conductive |
Sample stage | Sample carrier size: 140mm dia. (Maximum 4" substrate can be placed) The sample carrier can be rotated at a speed of: 1-20 rpm (adjustable) The highest heating temperature of the sample carrier is 500℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | There are 2 mass flow meters installed inside the instrument, the range is: 0-200sccm |
Vacuum pump | Equipped with a set of molecular pump system, using one-button operation 80L/S |
Cooling system | 16L/min. |
Voltage | 220V 50HZ |
