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Downward-mounted four-target magnetron sputtering coater for Diamond coated powderDownward-mounted four-target magnetron sputtering coater for Diamond coated powderDownward-mounted four-target magnetron sputtering coater for Diamond coated powderDownward-mounted four-target magnetron sputtering coater for Diamond coated powderDownward-mounted four-target magnetron sputtering coater for Diamond coated powder

Downward-mounted four-target magnetron sputtering coater for Diamond coated powder

    Downward-mounted four-target magnetron sputtering coater is a special laboratory coating machine with four targets developed by our company. It is equipped with two DC power supply and two RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc

Downward-mounted four-target magnetron sputtering coater is a special laboratory coating machine with four targets developed by our company. It is equipped with two DC power supply and two RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.

 

Features

Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise;

The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time;

This model adopts the layout of under target, the sample table is on the top, and the height with the target surface can be precisely adjusted by program, and can be rotated and heated, with excellent performance.

 

Technical parameter

Product name

Downward-mounted four-target magnetron   sputtering coater

Product model

CY-MSH500X-Ⅳ-DCDCRFRF-SS

Input

AC220V,50Hz

Total power

6KW

Ultimate vacuum degree

5x10-4Pa

Sample table parameters

Size

150 Dia.

Height

70 mm adjustable

Heating

≤850℃

Rotation speed

1-20 rpm

Magnetron sputtering head parameters

Quantity

four-set,2-inch

Cooling mode

Water cooled,required   flow rate10L/min

Water chiller

10L/min circulating water cooling

Vacuum chamber

Size

500mmDia. × 550mm   H

Material

Stainless steel

Watch window

100mm Dia.

Open mode

front opening door

Gas flow controller

1channel 200sccm Ar;

Vacuum pump

Molecular pump system pumping,1200L/S

Film thickness gauge

Quartz vibrating film   thickness gauge ,

one   set,Resolution 0.10 Å

Sputter power supply

DC power supply:two   set,500W,for metal films

RF power supply:two   set,500W,for non-metallic films

Operating mode

CYKY self-developed professional control   system

Overall dimensions

1250mm X 1000mm X2000mm

Total weight

500kg

 


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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