Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. this magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. this magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.
In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.
product name | Double target magnetron sputtering coater |
Product number | CY-MSV300- II-DCRF-SS |
Item | Detail |
Voltage | AC220V,50Hz |
Power | 3KW |
Ultimate vacuum | 10-6 torr |
Sample stage | Size:dia.150mm Heating temperature:MAX.500℃ lAccuracy:±1℃ Speed:1~20rpm adjustable |
Magnetron sputtering head | Number: two ,2-inch Cooling mode: Water cooling,10L / min flow rate |
Vacuum Chamber | Size:dia.300mm × 300mm H Material:stainless steel Observation window:dia.100mm Opening mode:Open top, easy to replace the target |
Gas flow controller | 2 channels: Ar, N2;Range 0-100sccm |
Vacuum pump | Molecular pump system, pumping speed: 600L/S |
Film thickness gauge | Quartz vibrating film thickness gauge, resolution: 0.10 μM |
Sputtering power supply | One DC power supply, 1000W, suitable for preparing metal film One RF power supply, 500W, suitable for non-metallic coating |
Operation mode | Panel button operation |
Dimensions | 1400mm × 750mm × 1300mm |
Weight | 300 KG |
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