Desktop single-target magnetron sputtering coater with stainless steel cavity

Product Name

Desktop single-target magnetron   sputtering coater with stainless steel cavity

Product Model

CY-MSZ190-1-DC-SS

Installation Condition

1,Working environment temperature: 25℃±15℃,humidity: 55%Rh±10%Rh；

2,Equipment power supply：AC220V,50Hz, must be well grounded；

3,Rated power：1000w；

4,Equipment for gas：The equipment chamber should be filled with argon gas for cleaning.   The customer should prepare argon gas with purity ≥99.99%.

5,Table size requirements: 600mm×600mm×700mm,bearing capacity ≥ 50kg；

6,The position should be well ventilated and cooled.

Technical Indicators

1、 Sputtering power supply：DC power supply 300W；maximum output voltage   600V,limited current output 500mA

2、 Magnetron target：2 inch balance target,magnetic   coupling baffle；

3、 Suitable target material： φ50mm x 3mm in thickness

4、 Cavity size ：outside   diameter194,inside diameter186mm x height 230mm

5、 Cavity material： 304 stainless steel

6、 Rotating heating sample   table：rotate   speed 1~20rpm  continuously adjustable；maximum heating   temperature 500℃,the   lowest recommended heating rate 10℃/min,the   highest recommended heating rate 20℃/min.

7、 Cooling mode ：magnetic target and   molecular pump require circulating water cooler

8、 Water-cooling machine：the tank volume 9L,flow   rate 10L/min

9、 Gas supply system：mass flow meter, type of   gas Argon,flow 1~30sccm（customizable）

10、 Accuracy of flow meter ：±1.5% measuring range

11、 The air pumping interface   of the vacuum chamber is KF25

12、 Air intake interface is   1/4 inch double ferrule joint

13、 Touch screen is 7inch   color touch screen

14、 Adjustable sputtering   current,sputtering safety current value and safety vacuum value can be set；

15、  safety protection: over current, vacuum is too low   automatically cut off the sputtering current

16、 Ultimate vacuum：5E-4Pa(matching molecular   pump)；

17、 Vacuum   measurement is Parana vacuum gauge ,the range is：1～105Pa

Notice

1,Magnetron sputtering   has a high working vacuum, generally within 2Pa, and needs to be used with   molecular pump. 

2,In order to achieve a   high oxygen free environment, the vacuum chamber should be cleaned at least 3   times with high purity inert gas。

3,Magnetron sputtering is   sensitive to the air intake, so mass flow meter is needed to control the air   intake

Optional accessory

Film

thickness Monitor

1,Film thickness   resolution：0.0136Å（aluminum）

2,Accuracy of film   thickness ：±0.5%,it   depends on process conditions, especially sensor position, material stress,   temperature and density  

3,Measuring speed：100ms-1s/times,measurement   range can be set ：500000Å（aluminum）

4,Standard sensor crystal：6MHz

5,Suitable for wafer   frequency：6MHz  

suitable for wafer size：Φ14mm

mounting flange：CF35

Another Accessory

·             1,CY-CZK103 series high performance   molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~105Pa)

CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~102Pa)

VRD-4 bipolar rotary vane   vacuum pump

2,KF25 Vacuum bellows;   The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket

3,Film thickness meter   crystal oscillator;