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Desktop single-target magnetron coater with bias voltageDesktop single-target magnetron coater with bias voltageDesktop single-target magnetron coater with bias voltageDesktop single-target magnetron coater with bias voltageDesktop single-target magnetron coater with bias voltage

Desktop single-target magnetron coater with bias voltage

    This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering. 


This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering. 

Desktop single-target magnetron coater with bias voltage

single-target magnetron sputtering coater Structure setting:

This single-target magnetron sputtering coater is equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.

single-target magnetron sputtering coater technical parameter:

 

Product Name

Desktop single-target magnetron coater with   bias voltage

Product Model

CY-MSZ180-1-DC-Q Bias   voltage

Installation Condition

1,Working environment temperature: 25±15℃,humidity: 55%Rh±10%Rh

2,Equipment power supplyAC220V50Hz must be well grounded

3,Rated power1000w

4,Equipment for gasThe equipment chamber should be filled with argon gas for cleaning.   The customer should prepare argon gas with purity ≥99.99%.

5,Table size requirements: 600mm×600mm×850mmbearing capacity ≥ 50kg

6,The position should be well ventilated and cooled.

Technical Indicators

1、 Sputtering power supplyDC power supply 300Wmaximum output voltage   600Vlimited   current output 500mA

2、 Magnetron target2 inch balance targetmagnetic coupling baffle

3、 Bias power supply: output   voltage <1000V, type: high-frequency pulse DC power supply  

4、 Suitable target material φ50mm x 3mm in thickness

5、 Cavity size outside   diameter194,inside diameter186mm x height 230mm

6、 Cavity material 304 stainless steel

7、 Rotating heating sample   tablerotate   speed 1~20rpm  continuously adjustablemaximum heating   temperature 500the lowest recommended   heating rate 10/minthe highest recommended   heating rate 20/min.

8、 Cooling mode magnetic target and   molecular pump require circulating water cooler

9、 Water-cooling machinethe tank volume 9Lflow rate 10L/min

10、 Gas supply systemmass flow meter type of gas Argonflow 1~30sccmcustomizable

11、 Accuracy of flow meter ±1.5% measuring range

12、 The air pumping interface   of the vacuum chamber is KF25

13、 Air intake interface is   1/4 inch double ferrule joint

14、 Touch screen is 7inch   color touch screen

15、 Adjustable sputtering   currentsputtering   safety current value and safety vacuum value can be set

16、  safety protection: over current, vacuum is too low   automatically cut off the sputtering current

17、 Ultimate vacuum5E-4Pa(matching molecular   pump)

18、 Vacuum   measurement is Parana vacuum gauge the range is1105Pa

Notice

1,Magnetron sputtering   has a high working vacuum, generally within 2Pa, and needs to be used with   molecular pump. 

2,In order to achieve a   high oxygen free environment, the vacuum chamber should be cleaned at least 3   times with high purity inert gas

3,Magnetron sputtering is   sensitive to the air intake, so mass flow meter is needed to control the air   intake

Optional   Accessory

Film thickness monitor

1,Film thickness   resolution0.0136Åaluminum

2,Accuracy of film   thickness ±0.5%it depends on process   conditions, especially sensor position, material stress, temperature and   density  

3,Measuring speed100ms-1s/timesmeasurement range can be   set 500000Åaluminum

4,Standard sensor crystal6MHz

5,Suitable for wafer   frequency6MHz  

suitable for wafer sizeΦ14mm

mounting flangeCF35

Another accessory

·             1,CY-CZK103 series high performance   molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~105Pa)

CY-GZK60 series small molecular pump set(including composite vacuum gauge, measuring range   10-5Pa~102Pa)

VRD-4 bipolar rotary vane   vacuum pump

2,KF25 Vacuum bellows;   The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket

3,Film thickness meter   crystal oscillator;



Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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