This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering.
This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering.
This single-target magnetron sputtering coater is equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.
Copyright © Zhengzhou CY Scientific Instrument Co., Ltd. All Rights Reserved Update cookies preferences
| Sitemap | Technical Support: