Dual-target magnetron sputtering coater (with RF&DC power supply) CY-MSH300-II-RFDC-SS
Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Dual head magnetron sputtering coater equipment is a special laboratory coating instrument developed by our company. The magnetron sputtering coater equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.
After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory.
DC power supply:500W, Suitable for preparing metal films
RF power supply:500W, Suitable for preparing non - metallic films
Operating mode
All-in-one computer operation
Overall Dimensions
1090mm x 900mm x 1250mm
Total weight
350kg
magnetron sputtering coater video:
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