Three targets magnetron sputtering coater (with DC&RF power supply) CY-MSH300-II-DCRF-SS
Three targets magnetron sputtering coater is a special laboratory coating machine developed by our company. The equipment can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Magnetron sputtering coater equipment is a special laboratory coating machine developed by our company. The Magnetron sputtering coater equipment can be equipped with DC power supply and RF power supply. The power ranges from 500W to 1000W. It can be used to prepare single or multilayer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.
After compact design, the balance of volume and performance is realized, the appearance is beautiful and the function is comprehensive. The whole machine is controlled by touch screen and built-in one button coating program, which is easy to operate and is an ideal equipment for preparing thin films in laboratory.
Three targets magnetron sputtering coater technical parameters:
Power supply
AC220V，50Hz
Whole power
6KW
Ultimate vacuum
5x10-4Pa
Sample table parameters
Size
φ150mm
Heat temp
500℃ max.
Temp control
±1℃
Rotation speed
1-20rpm adjustable
Magnetron sputtering head parameters
Quantity
Size:2 inches x3
Cooling mode
Water cooled, flow 10L/min required
Water chiller
10L/min Circulating water cooling
Vacuum chamber
Size
φ300mm x 340mm H
Material
SUS
Watch window
φ100mm
Opening mode
open type, easy to replace target
Gas flow controller
One-channel,200sccm Ar;
Vacuum pump
A molecular pump system, pumping 600L/S
Quartz vibrating film thickness gauge
One set, resolution 0.10 angstrom
Sputter power source
DC power supply:500W x2, Suitable for preparing metal films
RF power supply:500W, Suitable for preparing non - metallic films
Operating mode
All-in-one computer operation
Overall Dimensions
1090mm x 900mm x 1250mm
Total weight
350kg
Three targets magnetron sputtering coater video:
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