Four sources thermal evaporating system is a compact thermal evaporating system with total 4 evaporating source crucibles and precision and programmable temperature control. Four evaporating crucibles could be used to deposit multiple different materials to grow multilayers films one by one in the same chamber atmosphere.
Four sources thermal evaporating system is suitable for coating most of metallic and organic materials film up to 2" size from 200 ºC to 1500 ºC (or 200 ºC - 1700 ºC with an optional B-type thermocouple).The sample stage can be rotated to obtain a more uniform film.The evaporating system is small in size, which can effectively save laboratory space; it is easy to operate and has strong adaptability to different materials, so it is widely used in the laboratories of universities and research institutes.
1. 280 mm O.D.×260 mm I.D.×310 mm Height quartz chamber for easy cleaning and sample loading
2. 2" Dia rotatable evaporating sources for the uniform film coating
3. Tungsten coil heater and alumina crucible for high-temperature coating up to 1700 ºC
4. Precision temperature control with 30 programmable segments and +/- 1 ºC accuracy
5. High vacuum can be achieved up to 1.0E-5 Torr via optional turbopump
6. Gas flow port and valve are built in for chamber purge and CVD possibility
Input Power |
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Temperature Control & Heaters |
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Rotatable Sample Holder |
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Vacuum |
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Gas Inlet |
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Quartz Chamber Dimension | O.D.:280mm (11"), I.D.: 260mm (10.2"), Length: 310mm (12.2") |
Warranty | One year limited warranty with lifetime support |
Net Weight | 80 kg |
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