DC/RF dual-head high vacuum magnetron plasma sputtering coater is a compact magnetron sputtering system with dual 2 target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material.
DC/RF dual-head high vacuum magnetron plasma sputtering coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.
Input Power | Single phase 220 VAC 50 / 60 Hz, 2000 W (including vacuum pump and water chiller) |
Source Power |
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Magnetron Sputtering Head |
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Vacuum Chamber |
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Sample Stage |
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Gas Flow Control |
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Vacuum Pump Station |
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Water Chiller |
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Overall Dimensions | Lid closed: 48" × 28" × 32" Lid open: 48" × 28" × 37" |
Net Weight | 160 kg |
Warranty | One years limited warranty with lifetime support |
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