Three target magnetron sputtering coater is a cost-effective coating equipment independently developed by our company; it has standardization, modularization and customization. Three 3-inch magnetron sputtering target, one is high intensity magnetic target, two are permanent target; the power supply is two 500W DC power supply and one 300W RF power supply, the DC power supply can be used in the preparation of metal film, and the RF power supply can be used in the preparation of non-metal film, three target can meet the needs of multi-layer or multiple coating.
Three target magnetron sputtering coater equipment is equipped with two high-precision mass flow meters. If the customers has additional requirement, the gas path of up to four can be customized to meet the requirements of complex gas environment construction. The instrument is equipped with advanced turbo-molecular pumps, the ultimate vacuum can up to 1.0E-5Pa, while other types of molecular pump are available for purchase. The gas path of molecular pump is controlled by multiple solenoid valves, which can open the chamber to take out samples without turning off the pump, and can greatly improving your work efficiency. The product can be equipped with integrated industrial control computer to control the system, the most of function like the control to vacuum pump group and sputtering power supply can be realized in the computer program, it can further improve your experiment efficiency.
Three target magnetron coater application range:
The equipment can be used in the preparation of single or multilayer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, oxide film, hard film, PTFE film and so on. Compared with similar equipment, the three target magnetron coater is not only widely used but also has the advantages of small volume and easy operation. It is an ideal equipment for preparing material film in the laboratory.
Three target magnetron sputtering coater technical paremeters:
Product name | Three-target magnetron sputtering coater---lower position of target gun(English operation interface) |
Product model | CY-MSH325-III-DCDCRF-SS |
Sputtering power supply | Installed two DC power supply and one RF power supply DC power: 500W RF power: 300W |
Vacuum chamber | Vacuum chamber: 450 mm Diameter x 450 mm height，stainless steel observation window: 100 mm diameter |
Magnetron sputtering head | The instrument is equipped with three 3-inch target magnetron sputtering target guns(one of which is a strong magnetic target and two permanent magnet targets ),and all have water-cooled interlayer, which can be cooled by cooling water to target material |
The sample table | The sample table size：150mm dia.(the sample table can rotate, with adjustable speed range:1-20rpm) The maximum heating temperature of the sample table is 750℃, and the temperature control accuracy is +/- 1.0 °C |
Gas flow controller | A mass flow meter is installed inside the instrument Range :0-200sccm (argon) Gas flow can be set in 15.6 inch screen intelligent control system |
Vacuum pump | Equipped with a set of molecular pump system, using one-clickoperation600L/S |
Vacuum gauge | EF Kompirani vacuum gauge MPG400 Measurement range: 5 x 10-9 mbar -- Atmospheric pressure |
Film thickness gauge | The quartz vibration film thickness gauge is mounted on the equipment and can monitor the film thickness in real time with a resolution of 0.1A. |
Voltage | 220V 50HZ |
Notes | 1.three 3-inch sputtering target (one strong magnetic target and two permanent magnetic targets) 2.one flow meter 3.stainless steel vacuum chamber 4.molecular pump group 5.film thickness gauge 6.two DC power supply and one RF power supply 7.water chilling unit 8.with rotary heating sample table 9.15.6 inch screen intelligent control system 10.air compressor 11.electrically controlled pneumatic gate valve 12.electrically controlled cut-off valve 13.electrically controlled pneumatic side pumping valve 14. EF kang vacuum gauge MPG 400 measuring range |
