three head 2" RF Plasma magnetron sputtering coater designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.
three head 2" RF Plasma magnetron sputtering coater designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.
Input Power | ·Single phase 110 VAC, 50 / 60 Hz |
Magnetron Sputtering Head | ·Three 2" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps |
Sputtering Target | ·Target size requirement: 2" diameter x 1/8" thickness max |
Vacuum Chamber | ·Vacuum chamber: 300 mm OD x 500 mm Height, made of stainless steel |
Sample Holder | ·Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover |
Vacuum Pump | ·KF40 vacuum port is built in for connecting to a vacuum pump. |
Size | 540 mm L x 540 mm W x 1000 mm H |
Packing Weight | |
Warranty | One years limited warranty with lifetime support |
Whether to support customization | yes |
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