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3 Heads Compact desktop magnetron sputtering coater3 Heads Compact desktop magnetron sputtering coater3 Heads Compact desktop magnetron sputtering coater3 Heads Compact desktop magnetron sputtering coater3 Heads Compact desktop magnetron sputtering coater

3 Heads Compact desktop magnetron sputtering coater

    three head 2" RF Plasma magnetron sputtering coater designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.

three head 2" RF Plasma magnetron sputtering coater designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.

3 Heads Compact desktop magnetron sputtering coater

magnetron sputtering coater technical parameters:

Input Power
   

·Single phase 110 VAC, 50 / 60 Hz
  ·1000 W (including vacuum pump and water chiller)

Magnetron Sputtering Head
   

·Three 2" magnetron sputtering   heads with water cooling jackets are included and inserted into quartz   chamber via quick clamps
  ·RF cable replacement can be purchased at CYKY
  ·One manually operated shutter is built on the flange
  ·One 10 L/min digitally controlled recirculating water chiller is included   for cooling sputtering heads

Sputtering Target

·Target size requirement: 2"   diameter x 1/8" thickness max
  ·Sputtering distance range: 50 - 80 mm adjustable
  ·Sputtering angle range: 0 - 25° adjustable 
  ·2" diameter Cu target and Al2O3 target are included for demo   testing
  ·Various oxide 2" sputtering targets are available upon request at extra   cost
  ·For target bonding, 1 mm and 2 mm copper backing plates are included.

Vacuum Chamber

·Vacuum chamber: 300 mm OD x  500   mm Height, made of stainless steel
  ·Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone   O-ring
  ·Stainless steel shield cage is included for 100% shielding of RF radiation   from the chamber
  ·Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber   baking 

Sample Holder

·Sample holder is a rotatable and   heatable stage made of ceramic heater with stainless steel cover
  ·Sample holder size: 50 mm Dia. for. 2" wafer max
  ·Rotation speed: 1 - 10 rpm adjustable for uniform coating
  ·The holder temperature is adjustable from RT to 600 °C max (5 min max at 600   °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature   controller

Vacuum Pump  

·KF40 vacuum port is built in for   connecting to a vacuum pump.
  ·Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump
  1.0E-3 Torr with optional turbo pump

Size

540 mm L x 540 mm W x 1000 mm H

Packing  Weight

About 145 kg

Warranty 

One years limited warranty with   lifetime support 

Whether to support customization

yes



Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




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